Author:
Reuther Freimut,Pfeiffer Karl,Fink Marion,Gruetzner Gabi,Schulz Hubert,Scheer Hella-Christin,Gaboriau Freddy,Cardinaud Christophe
Cited by
13 articles.
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1. Pattern definition by nanoimprint;Micro-Optics 2012;2012-06-01
2. Experimental analysis for process control in hybrid lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2011-11
3. Thermal nanoimprint (T-NIL) with photoresists for hybrid lithography;27th European Mask and Lithography Conference;2011-02-02
4. Aspects of hybrid pattern definition while combining thermal nanoimprint with optical lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2010-11
5. Potential and limitations of a T-NIL/UVL hybrid process;Microelectronic Engineering;2010-05