Fluid modeling for plasma-enhanced direct current chemical vapor deposition-Reference-Cited by-同舟云学术

Fluid modeling for plasma-enhanced direct current chemical vapor deposition

Published:2015-09-28 Issue:1 Volume:10 Page:012503
ISSN:1934-2608
Container-title:Journal of Nanophotonics
language:en
Short-container-title:J. Nanophoton

Author:

Ismagilov Rinat R.¹,Khamidullin Ildar R.²,Kleshch Victor I.¹,Malykhin Sergei A.¹,Alexeev Andrey M.¹,Obraztsov Alexander N.³

Affiliation:

1. M.V. Lomonosov Moscow State University, Department of Physics, Leninskie Gory 1, Moscow 119991, RussiabA.M. Prokhorov General Physics Institute of the RAS, Vavilov Street 38, Moscow 119991, Russia

2. Bashkir State University, Department of Economics and Mathematics, Traktovaya Street 1, Neftekamsk 452681, Russia

3. M.V. Lomonosov Moscow State University, Department of Physics, Leninskie Gory 1, Moscow 119991, RussiabA.M. Prokhorov General Physics Institute of the RAS, Vavilov Street 38, Moscow 119991, RussiadUniversity of Eastern Finland, Department of Physics and M

Publisher

SPIE-Intl Soc Optical Eng

Subject

Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference21 articles.

1. Honeycomb Carbon: A Review of Graphene

2. CVD nanographite films covered by ALD metal oxides: structural and field emission properties

3. Making graphene on a large scale

4. Optical Chacterization of Plasma Enhanced Chemical Vapor Deposition of Nanocarbon Film Materials

5. One-dimensional fluid model for an rf methane plasma of interest in deposition of diamond-like carbon layers

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