Hybrid enabled thin film metrology using XPS and optical-Reference-Cited by-同舟云学术

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Hybrid enabled thin film metrology using XPS and optical

Published:2016-03-24 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Vaid Alok¹,Iddawela Givantha¹,Mahendrakar Sridhar¹,Lenahan Michael¹,Hossain Mainul¹,Timoney Padraig¹,Bello Abner F.¹,Bozdog Cornel²,Pois Heath²,Lee Wei Ti²,Klare Mark²,Kwan Michael²,Kang Byung Cheol³,Isbester Paul³,Sendelbach Matthew³,Yellai Naren³,Dasari Prasad³,Larson Tom²

Affiliation:

1. GLOBALFOUNDRIES, Inc. (United States)

2. ReVera Inc. (United States)

3. Nova Measuring Instruments, Inc. (United States)

Publisher

SPIE

Reference6 articles.

1. Impact of shrinking measurement error budgets on qualification metrology sampling and cost,;Sendelbach,2014

2. ISO Guide to the Expression of Uncertainty in Measurement, ISO, Geneva, 2006

3. A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM,;Vaid,2011

4. Nested uncertainties and hybrid metrology to improve measurement accuracy,;Silver,2011

5. Hybrid metrology solution for 1X node technology,;Vaid,2012

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Review of nanosheet metrology opportunities for technology readiness;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-04-18

2. Metrology and inspection required for next generation lithography;Japanese Journal of Applied Physics;2017-04-24

3. Complex metrology on 3D structures using multi-channel OCD;SPIE Proceedings;2017-03-28

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