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EUV scanner printability evaluation of natural blank defects detected by actinic blank inspection

  • Published:2015-07-09 Issue: Volume: Page:
  • ISSN:0277-786X
  • Container-title:Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
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Author:

Takagi Noriaki,Watanabe Hidehiro,Van den Heuvel Dieter,Jonckheere Rik,Gallagher Emily

Publisher

SPIE

Reference5 articles.

1. The performance of an actinic full-field EUVL mask blank inspection system;Yamane,2009

2. Development of actinic full-field EUV mask blank inspection tool at MIRAI-Selete;Terasawa,2009

3. Experimental verification of the effect of phase defect shape on ABI signal intensity;Takagi,2014

4. Correlation of actinic blank inspection.and experimental phase defect printability on NXE3x00 EUV scanner;Jonckheere,2015

5. Tomohiro Suzuki, Hiroki Miyai, Kiwamu Takehisa, Haruhiko Kusunose, Takeshi Yamane, Tsuneo Terasawa, Hidehiro Watanabe, Soichi Inoue, Ichiro Mori, “EUV Actinic Blank Inspection Tool with a High Magnification Review Mode”, Proc. of SPIE Vol. 8441, 844115(2012)

Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Phase-independent multilayer defect repair for EUV photomasks;SPIE Proceedings;2016-10-04

2. Defect avoidance for EUV photomask readiness at the 7 nm node;SPIE Proceedings;2016-05-10

3. Toward defect-free fabrication of extreme ultraviolet photomasks;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-04-12

4. Evaluation of multilayer defect repair viability and protection techniques for extreme ultraviolet masks;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-03-18

5. Viability of pattern shift for defect-free extreme ultraviolet lithography photomasks;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-02-02
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