Author:
Hu C. M.,Lo Fred,Yang Elvis,Yang Tahong,Chen K. C.
Reference8 articles.
1. Fundamental investigation of negative tone development (NTD) for the 22nm node (and beyond);Landie,2011
2. Comparing positive and negative tone development process for printing the metal and contact layers of the 32- and 22-nm nodes
3. Application of an inverse Mack model for negative tone development simulation;Gao,2011
4. Resist profile modeling with compact resist model;Zuniga,2015
5. A Physics-based Model for Negative Tone Development Materials
Cited by
2 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献