Particle control challenges in process chemicals and ultra-pure water for sub-10nm technology nodes-Reference-Cited by-同舟云学术

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Particle control challenges in process chemicals and ultra-pure water for sub-10nm technology nodes

Published:2014-04-17 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

Rastegar Abbas¹,Samayoa Martin¹,House Matthew¹,Kurtuldu Hüseyin¹,Eah Sang-Kee¹,Morse Lauren¹,Harris-Jones Jenah¹

Affiliation:

1. SEMATECH Inc. (United States)

Publisher

SPIE

Reference20 articles.

1. Production of EUV mask blanks with low killer defects;Antohe,2014

2. Evaluation of transfer of particles from dual-pod base plate to EUV mask;Yonekawa,2010

3. Investigation of EUV pellicle feasibility;Scaccabarozzi,2013

4. Effect of radiation exposure on the surface adhesion of Ru-capped MoSi multilayer blanks;Durkaya,2012

5. KS-18FX, RION, http://www.rion.co.jp/dbcon/pdf/KS-18FX-E.pdf.

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1. Development of an SI Traceable Measurement Method for the Number Concentration of Liquid-borne Particles;Journal of the Society of Powder Technology, Japan;2023-07-10

2. Evaluation of Three Sample Introduction Systems for Impurity Analysis of an Ultrapure Reagent Using a Scanning Mobility Particle Sizer;ACS Omega;2022-04-15

3. Mechanism of silica nanoparticles removal in an isopropyl alcohol/water solution with an anion exchange membrane;Journal of Molecular Liquids;2022-02

4. Electrical Measurements to Detect Liquid Concentration;IEEE Transactions on Semiconductor Manufacturing;2022-02

5. Primary standard for the number concentration of liquid-borne particles: extension of the diameter range from the micrometer to the sub-micrometer level and reduction of the measurement uncertainty;Metrologia;2021-07-19

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