1. Results of an international photomask linewidth comparison of NIST and PTB;Bodermann,2009
2. Progress on implementation of a reference measurement system based on a critical-dimension atomic force microscope;Ndubuisi,2007
3. Improving optical measurement uncertainty with combined multitool metrology using a Bayesian approach
4. Calibration of CD mask standards for the 65 nm mode: CoG and MoSi;Richter,2007
5. Guide to the expression of uncertainty in measurement, ISO, 1995, 110 p., ISBN 92-67-10188-9