Line-edge roughness performance targets for EUV lithography
Author:
Affiliation:
1. GLOBALFOUNDRIES Inc. (United States)
2. Fractilia (United States)
Publisher
SPIE
Reference20 articles.
1. EUV Lithography: Past, Present & Future;Wood,2016
2. Evaluation of EUV resist materials for use at the 32 nm half-pitch node
3. EUV Resist Stochastics;Lio,2016
4. Resist blur and line edge roughness
5. Life on the edge: EUV insertion challenge;Borodovsky,2012
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