Gap-optimized Moiré phase imaging alignment for proximity lithography-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Gap-optimized Moiré phase imaging alignment for proximity lithography

Published:2015-01-29 Issue:1 Volume:54 Page:017105
ISSN:0091-3286
Container-title:Optical Engineering
language:en
Short-container-title:Opt. Eng

Author:

Zhu Jiangping¹,Hu Song²,You Zhisheng¹,Su Xianyu³

Affiliation:

1. Sichuan University, School of Computer Science and Technology, Chengdu 610064, China

2. Chinese Academy of Sciences, State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chengdu 610209, China

3. Sichuan University, School of Electronics and Information, Chengdu 610064, China

Publisher

SPIE-Intl Soc Optical Eng

Subject

General Engineering,Atomic and Molecular Physics, and Optics

Reference20 articles.

1. Alignment measurement method for imprint lithography using moiré fringe pattern

2. Alignment method based on matched dual-grating moiré fringe for proximity lithography

3. Extraordinary optical transmission through sub-wavelength hole arrays

4. Ultra-precision engineering in lithographic exposure equipment for the semiconductor industry

5. A new interferometric alignment technique

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Simple visual focusing and alignment technology for digital lithography;Optics and Lasers in Engineering;2024-10

2. 光刻对准关键技术的发展与挑战;Acta Optica Sinica;2023

3. Moire interferometry patterns for rotational alignment of structures;SPIE Proceedings;2016-08-28

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP