Highly sensitive focus monitoring technique based on illumination and target co-optimization-Reference-Cited by-同舟云学术

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Highly sensitive focus monitoring technique based on illumination and target co-optimization

Published:2016-03-24 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

Lee Myungjun¹,Smith Mark D.¹,Subrahmanyan Pradeep¹,Levy Ady¹

Affiliation:

1. KLA-Tencor Corp. (United States)

Publisher

SPIE

Reference8 articles.

1. Signal response metrology (SRM): a new approach for lithography metrology,;Pandev,2015

2. Scanner focus metrology for advanced node scannermonitoring and control;Kim,2015

3. Quantitative stepper metrology using the focus monitor test mask

4. New phase-shift gratings for measuring aberrations

5. A novel focus monitoring technique using Iso-Dense overlay mark;Li,2013

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Quantifying imaging performance bounds of extreme dipole illumination in high NA optical lithography;SPIE Proceedings;2016-10-03

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