Diffraction analysis of digital micromirror device in maskless photolithography system-Reference-Cited by-同舟云学术

Diffraction analysis of digital micromirror device in maskless photolithography system

Published:2014-12-16 Issue:4 Volume:13 Page:043016
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Xiong Zheng¹,Liu Hua²,Tan Xiangquan²,Lu Zhenwu²,Li Cuixia¹,Song Liwei²,Wang Zhi²

Affiliation:

1. Chinese Academy of Sciences, Changchun Institute of Optics, Fine Mechanics and Physics, Changchun 130033, ChinabUniversity of Chinese Academy of Sciences, Beijing 130039, China

2. Chinese Academy of Sciences, Changchun Institute of Optics, Fine Mechanics and Physics, Changchun 130033, China

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

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