Radiation sensitive developable bottom anti-reflective coatings (DBARC): recent results-Reference-Cited by-同舟云学术

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Radiation sensitive developable bottom anti-reflective coatings (DBARC): recent results

Published:2009-03-13 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Advances in Resist Materials and Processing Technology XXVI
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Author:

Houlihan Francis M.,Dioses Alberto,Kudo Takanori,Li Meng,Zhang Lin,Vasanthan Sumathy,Chakrapani Srinivasan,Parthasarathy Deepa,Antonio Charito,Ng Edward,Lu Ping-Hung,Neisser Mark,Padmanaban Munirathna

Publisher

SPIE

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. PAG and Quencher Effects on DBARC Performance;Journal of Photopolymer Science and Technology;2011

2. Resist Residue in Ion Implantation Level Lithography;Japanese Journal of Applied Physics;2010-06-21

3. Process optimization consideration for 193nm developable bottom anti-reflective coatings (DBARCs);SPIE Proceedings;2010-03-11

4. Design and development of production-worthy developable BARCs(DBARCs) for implant lithography;SPIE Proceedings;2010-03-11

5. Design and Development of Developable BARCs (DBARCs) for Advanced Lithographic Applications;Journal of Photopolymer Science and Technology;2010

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