<title>Optimization of optical properties of resist processes

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Optimization of optical properties of resist processes

Published:1991-06-01 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Advances in Resist Technology and Processing VIII
language:
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Author:

Brunner Timothy A.

Publisher

SPIE

Cited by 55 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Highly uniform silicon field emitter arrays fabricated using a trilevel resist process;Journal of Vacuum Science & Technology B;2020-03

2. Acid Diffusion at ArF Resist/Si-hardmask Interface;Journal of The Adhesion Society of Japan;2015

3. Photolithography;Materials Science and Technology;2013-02-15

4. Optimum design of photoresist thickness for 90-nm critical dimension based on ArF laser lithography;Chinese Physics B;2012-08

5. Diffusion of acid from resist to Si-hardmask layer;SPIE Proceedings;2012-03-29

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