Author:
Han Woo-Sung,Lee Joong-Hyun,Park Jung-Chul,Park Choon-Geun,Kang Hoyoung,Koh Young-Bum,Lee Moon-Yong
Cited by
5 articles.
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1. Photolithography;Materials Science and Technology;2013-02-15
2. Liquid phase silylation of a bilayer resist system using blended deep-UV resists;Microelectronic Engineering;1999-08
3. Liquid phase silylation of a bilayer resist system;Microelectronic Engineering;1999-08
4. Silylated photoresist profiles imaged at 193 nm;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1998-05
5. Comparative evaluation of chemically amplified resists for electron-beeam top surface imaging use;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1994-11