An efficient auto TPT stitch guidance generation for optimized standard cell design-Reference-Cited by-同舟云学术

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An efficient auto TPT stitch guidance generation for optimized standard cell design

Published:2015-03-18 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Samboju Nagaraj C.,Choi Soo-Han,Arikati Srini,Cilingir Erdem

Publisher

SPIE

Reference7 articles.

1. A fast triple patterning solution with fix guidance;Fang,2014

2. Soo Han Choi, Srini Arikati, Erdem Cilingir, “Categorized Stitching Guidance for Triple-Patterning Technology”, United States Patent, provisional application no. 61/975,701

3. Layout decomposition for triple patterning lithography;Yu,2011

4. Proceedings of the International Conference on Computer-Aided Design - ICCAD '12

5. An efficient layout decomposition approach for triple patterning lithography;Kuang,2013

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Lithography and OPC friendly triple patterning decomposition method for VIA;SPIE Proceedings;2017-03-24

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