Uncertainty evaluation of ellipsometer: from instrumentation to material and application in Avogadro's project

Author:

Liu Wende1,Chen Chi1,Fan Qiming1,Chu Chu1

Affiliation:

1. National Institute of Metrology (China)

Publisher

SPIE

Reference13 articles.

1. Assessment of ultra-thin SiO2 film thickness measurement precision by ellipsometry,;Chandler-Horowitz,2003

2. An evaluation of errors in determining the refractive index and thickness of thin SiO2 films using a rotating analyzer ellipsometer

3. Limits to the precision of electrooptic and magneto-optic sensors,;Day,1987

4. Surface and Interface Analysis

5. “ISO/IEC GUIDE 98-3/Suppl.1: 2008 Uncertainty of measurement-Part 3: Guide to the expression of uncertainty in measurement (GUM: 1995) Supplement: Propagation of distribution using a Monte Carlo method”

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