Author:
Mangat Pawitter J. S.,Hector Scott D.,Rose Stewart,Cardinale Gregory F.,Tejnil Edita,Stivers Alan R.
Cited by
22 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Mask Materials and Designs for Extreme Ultra Violet Lithography;Electronic Materials Letters;2018-03-21
2. Absorber stack with transparent conductive oxide layer for extreme ultraviolet lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2009
3. Extreme ultraviolet lithography: A review;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2007
4. Numerical modeling of absorber characteristics for EUVL;SPIE Proceedings;2006-03-10
5. Masks for Extreme Ultraviolet Lithography;Handbook of Photomask Manufacturing Technology;2005-04-07