Publisher
SPIE-Intl Soc Optical Eng
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference9 articles.
1. Optimization criteria for SRAM design: lithography contribution
2. See http://www.-inst.eecs.berkeley.edu/∼ee42/Fall2002/LectNotes/Lect24.pdf, p. 6.
3. Lithographic effects of mask critical dimension error
4. S. Hansen, TDC, ASML, CD-SEM data for 90 nm 6% attPSM, personal communications.
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