Advanced photomask repair technology for 65-nm lithography-Reference-Cited by-同舟云学术

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Advanced photomask repair technology for 65-nm lithography

Published:2006-05-04 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Aramaki Fumio,Kozakai Tomokazu,Sugiyama Yasuhiko,Muramatsu Masashi,Koyama Yoshihiro,Matsuda Osamu,Suzuki Katsumi,Okabe Mamoru,Hagiwara Ryoji,Yasaka Anto,Adachi Tatsuya,Tanaka Yoshiyuki,Suga Osamu,Nishida Naoki,Usui Youichi

Publisher

SPIE

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Phase defect mitigation strategy: unveiling fiducial mark requirements on extreme ultraviolet lithography masks;Journal of Micro/Nanolithography, MEMS, and MOEMS;2013-05-31

2. Phase defect mitigation strategy: fiducial mark requirements on extreme ultraviolet lithography mask;SPIE Proceedings;2012-03-29

3. Surface Morphology of Diamond-Like Carbon Film and Si Wafer Milled with 30 keV Gallium Focused Ion Beam;Japanese Journal of Applied Physics;2010-06-21

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