Author:
Chovino Christian,Dieu Laurent,Johnstone Eric,Reyes Julio,La Fontaine Bruno M.,Levinson Harry J.,Pawloski Adam R.
Cited by
6 articles.
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1. Pattern inspection of etched multilayer extreme ultraviolet mask;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-01-29
2. Pattern inspection of etched multilayer EUV mask;SPIE Proceedings;2015-10-23
3. Pattern inspection of etched multilayer EUV mask;Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII;2015-07-09
4. Combined absorber stack for optimization of the EUVL mask;SPIE Proceedings;2006-03-10
5. Novel absorber stack for minimizing shadow effect in extreme ultraviolet mask;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2006