Enhancing model accuracy and calibration efficiency with image based pattern selection using machine learning techniques-Reference-Cited by-同舟云学术

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Enhancing model accuracy and calibration efficiency with image based pattern selection using machine learning techniques

Published:2021-02-22 Issue: Volume: Page:
ISSN:
Container-title:Optical Microlithography XXXIV
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Author:

Sun Ren-Cheng,Kang Dae-Kwon,Jia Chester,Liu Meng,Shao De-Bao,Kim Young-Seok,Shin Jangho,Mark Simmons,Zhao Qian,Feng Mu,Zhao Yiqiong,Wang Shibing,Kim Sungho,Ko Sungwoo,Kim Shinyoung,Choi Jaeseung,Park Chanha

Publisher

SPIE

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Efficient measurement and optical proximity correction modeling to catch lithography pattern shift issues of arbitrarily distributed hole layer;Frontiers of Mechanical Engineering;2024-07-19

2. EUV OPC modeling of dry photoresist system for pitch 32nm BEOL;Optical and EUV Nanolithography XXXVII;2024-04-10

3. Layout pattern analysis and coverage evaluation in computational lithography;Optics Express;2023-02-23

4. Calibration of chemically amplified resist model to consider the top loss in projection lithography;Advances in Patterning Materials and Processes XXXIX;2022-05-25

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