Chemical durability studies of Ru-capped EUV mask blanks
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SPIE
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Stress, reflectance, and stability of Ru/Be multilayer coatings with Mo interlayers near the 11 nm wavelength;Optics Letters;2024-06-25
2. A study on the imaging characteristics of phase shift mask for EUV technology with novel material;Photomask Technology 2023;2023-11-21
3. Ru/Ta bilayer approach to EUV mask absorbers: Experimental patterning and simulated imaging perspective;Micro and Nano Engineering;2023-09
4. Contamination Removal From UV and EUV Photomasks;Developments in Surface Contamination and Cleaning, Volume 9;2017
5. Effective Carbon Contaminant Cleaning Condition Using Ozone Dissolved Water and Megasonic for Ru-Capped Extreme Ultraviolet Lithography Mask;Japanese Journal of Applied Physics;2012-09-01
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