Author:
Shirotori Akihide,Hoshino Manabu,Rathore Ashish,Yeh SinFu,De Simone Danilo .,Vandenberghe Geert,Matsumoto Hirokazu,Jani Nikhil
Cited by
4 articles.
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1. Design strategy of extreme ultraviolet resists;Japanese Journal of Applied Physics;2024-05-01
2. Main chain scission resists towards high-NA EUV lithography;Advances in Patterning Materials and Processes XLI;2024-04-09
3. Update on main chain scission resists in Zeon for high-NA EUV lithography;International Conference on Extreme Ultraviolet Lithography 2023;2023-11-21
4. Development on main chain scission resists for high-NA EUV lithography;Advances in Patterning Materials and Processes XL;2023-05-01