Author:
Ohmura Yasuhiro,Tsuge Yosuke,Hirayama Toru,Ikezawa Hironori,Inoue Daisuke,Kitamura Yasuhiro,Koizumi Yukio,Hasegawa Keisuke,Ishiyama Satoshi,Nakashima Toshiharu,Kikuchi Takahisa,Onda Minoru,Takase Yohei,Nagahiro Akimasa,Isago Susumu,Kawahara Hidetaka
Reference4 articles.
1. High-NA and low-residual-aberration projection lens for DUV scanner
2. The optical design for microlithographic lenses;Ohmura,2006
3. An aberration control of projection optics for multi-patterning lithography
4. Solution for high-order distortion on extreme illumination condition using computational prediction method;Kang,2015
Cited by
12 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献