Reduction lens and illumination system for deep-UV aligners
Author:
Liegel Juergen W.1,
Ittner Gerhard P.1,
Glatzel Erhard1,
Wangler Johannes1
Cited by
2 articles.
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1. Excimer lithography for ULSI;Optical and Quantum Electronics;1993-05
2. Aerial image formation with a KrF excimer laser stepper;Polymer Engineering and Science;1992-11