Sub-nanometer in-die overlay metrology: measurement and simulation at the edge of finiteness-Reference-Cited by-同舟云学术

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Sub-nanometer in-die overlay metrology: measurement and simulation at the edge of finiteness

Published:2013-05-13 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Smilde Henk-Jan H.,Jak Martin,den Boef Arie,van Schijndel Mark,Bozkurt Murat,Fuchs Andreas,van der Schaar Maurits,Meyer Steffen,Morgan Stephen,Bhattacharyya Kaustuve,Huang Guo-Tsai,Ke Chih-Ming,Chen Kai-Hsiung

Publisher

SPIE

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. In-situ calibration of the objective lens of an angle-resolved scatterometer for nanostructure metrology;Applied Optics;2023-05-10

2. Overlay and stitching metrology for massively parallel electron-beam lithography (Conference Presentation);Metrology, Inspection, and Process Control for Microlithography XXXII;2018-03-22

3. Optimizing the nanoscale quantitative optical imaging of subfield scattering targets;Optics Letters;2016-10-25

4. Enabling quantitative optical imaging for in-die-capable critical dimension targets;SPIE Proceedings;2016-03-25

5. Target design optimization for overlay scatterometry to improve on-product overlay;SPIE Proceedings;2015-03-19

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