Author:
Babin Sergey V.,Kahng Andrew B.,Mandoiu Ion,Muddu Swamy V.
Cited by
8 articles.
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1. Provably Good Max–Min- $m$ -Neighbor-TSP-Based Subfield Scheduling for Electron-Beam Photomask Fabrication;IEEE Transactions on Very Large Scale Integration (VLSI) Systems;2018-02
2. Correction of resist heating effect on variable shaped beam mask writer;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-03-23
3. Design for Manufacturability with E-Beam Lithography;Design for Manufacturability with Advanced Lithography;2016
4. EUV and e-beam manufacturability;Proceedings of the 52nd Annual Design Automation Conference;2015-06-07
5. Design for Manufacturing With Emerging Nanolithography;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2013-10