Imaging performance improvements by EUV mask stack optimization-Reference-Cited by-同舟云学术

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Imaging performance improvements by EUV mask stack optimization

Published:2011-02-02 Issue: Volume: Page:
ISSN:0277-786X
Container-title:27th European Mask and Lithography Conference
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Author:

Davydova Natalia,van Setten Eelco,de Kruif Robert,Oorschot Dorothe,Dusa Mircea,Wagner Christian,Jiang Jiong,Liu Wei,Kang Hoyoung,Liu Hua-yu,Spies Petra,Wiese Nils,Waiblinger Markus

Publisher

SPIE

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. EUV mask characterization with actinic scatterometry;International Conference on Extreme Ultraviolet Lithography 2018;2018-10-03

2. Investigation of alternative absorbers for extreme ultraviolet mask blanks;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-09-01

3. Black border, mask 3D effects: covering challenges of EUV mask architecture for 22nm node and beyond;SPIE Proceedings;2014-10-17

4. Study of CD variation caused by the black border effect and out-of-band radiation in extreme ultraviolet lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2014-05-07

5. Feasibility of compensating for EUV field edge effects through OPC;SPIE Proceedings;2014-04-17

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