Extending EUV lithography for DRAM applications-Reference-Cited by-同舟云学术

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Extending EUV lithography for DRAM applications

Published:2020-05-12 Issue: Volume: Page:
ISSN:
Container-title:Extreme Ultraviolet (EUV) Lithography XI
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Author:

Rispens Gijsbert,Van Lare Claire,Oorschot Dorothe,Hoefnagels Rik,Liu Shih-Hsiang,Van Mierlo Willem,Zuurbier Nadia,Dardani Zoi,Wang Ziyang,Maslow Mark John,Finders Jo,Fallica Roberto,Frommhold Andreas,Hendrickx Eric,Niroomand Ardavan,Light Scott

Publisher

SPIE

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. EUV source pole control for LCDU and CD ellipticity handling in hexagonal contact arrays;Optical and EUV Nanolithography XXXVII;2024-04-10

2. Single mask solution to pattern BLP and SNLP using 0.33NA EUV for next-generation DRAM manufacturing;International Conference on Extreme Ultraviolet Lithography 2022;2022-12-01

3. Poly(2-vinylpyridine)-b-poly(fluorinated methacrylate) Block Copolymers Forming 5 nm Domains Containing Metallocene;ACS Applied Polymer Materials;2020-07-17

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