Photoresist cross-sectional shape change caused by scanning electron microscope-induced shrinkage-Reference-Cited by-同舟云学术

Photoresist cross-sectional shape change caused by scanning electron microscope-induced shrinkage

Published:2015-07-09 Issue:3 Volume:14 Page:034001
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Ohashi Takeyoshi¹,Sekiguchi Tomoko¹,Yamaguchi Atsuko¹,Tanaka Junichi¹,Kawada Hiroki²

Affiliation:

1. Central Research Laboratory, Hitachi Ltd., Higashi-koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan

2. Hitachi High-Technologies Corp., Ichige, Hitachinaka-shi, Ibaraki 312-8504, Japan

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference24 articles.

1. International Technology Roadmap for Semiconductors 2013 Edition,2013

2. Impact of Long-Period Line-Edge Roughness (LER) on Accuracy in Critical Dimension (CD) Measurement and New Guideline for CD Metrology

3. Roadmap to sub-nanometer OPC model accuracy

4. High-accuracy optical proximity correction modeling using advanced critical dimension scanning electron microscope–based contours in next-generation lithography

5. CD changes of 193-nm resists during SEM measurement

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Atomic force microscopy based micro and nano sidewall imaging;Nanoscience;2024-09-04

2. The importance of less damaged and surface sensitive metrology to identify true EUV process monitoring;Metrology, Inspection, and Process Control XXXVIII;2024-04-10

3. Evaluation of the change in photoresist sidewall roughness due to electron beam-induced shrinkage using atomic force microscopy;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-12-07

4. Analysis of resist images with pattern defects by Hough transform;Japanese Journal of Applied Physics;2023-08-01

5. Photoresist shrinkage observation by a metrological tilting-AFM;Metrology, Inspection, and Process Control XXXVII;2023-04-27