Creation of guiding patterns for directed self-assembly of block copolymers by resistless direct e-beam exposure-Reference-Cited by-同舟云学术

Creation of guiding patterns for directed self-assembly of block copolymers by resistless direct e-beam exposure

Published:2015-09-21 Issue:3 Volume:14 Page:033511
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Evangelio Laura¹,Fernández-Regúlez Marta²,Borrisé Xavier³,Lorenzoni Matteo²,Fraxedas Jordi³,Pérez-Murano Francesc²

Affiliation:

1. Institut de Microelectrònica de Barcelona, Campus de la Universitat Autònoma de Barcelona, Bellaterra 08193, SpainbInstitut Català de Nanotecnologia, Campus de la Universitat Autònoma de Barcelona, Bellaterra 08193, Spain

2. Institut de Microelectrònica de Barcelona, Campus de la Universitat Autònoma de Barcelona, Bellaterra 08193, Spain

3. Institut Català de Nanotecnologia, Campus de la Universitat Autònoma de Barcelona, Bellaterra 08193, Spain

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference21 articles.

1. Cramming more components onto integrated circuits;Moore,1965

2. Advances in directed self assembly integration and manufacturability at 300 mm

3. Integration of Density Multiplication in the Formation of Device-Oriented Structures by Directed Assembly of Block Copolymer-Homopolymer Blends

4. Chemical Interactions and Their Role in the Microphase Separation of Block Copolymer Thin Films

5. Block Copolymer Thin Films: Physics and Applications

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