Multistack structure for an extreme-ultraviolet pellicle with out-of-band radiation reduction-Reference-Cited by-同舟云学术

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Multistack structure for an extreme-ultraviolet pellicle with out-of-band radiation reduction

Published:2015-10-07 Issue:4 Volume:14 Page:043501
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Lee Sung-Gyu¹,Kim Guk-Jin¹,Kim In-Seon¹,Ahn Jin-Ho²,Park Jin-Goo³,Oh Hye-Keun¹

Affiliation:

1. Hanyang University, Department of Applied Physics, 55 Hanyangdaehak-ro, Sangnok-gu, Ansan 426-791, Republic of Korea

2. Hanyang University, Division of Materials Science and Engineering, 222 Wangsimni-ro, Seongdong-gu, Seoul 133-791, Republic of Korea

3. Hanyang University, Department of Materials Engineering, 55 Hanyangdaehak-ro, Sangnok-gu, Ansan 426-791, Republic of Korea

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference28 articles.

1. Development of EUV pellicle for reticle defect mitigation;Shroff,2006

2. EUV pellicle development for mask defect control

3. Realization of EUV pellicle with single crystal silicon membrane;Akiyama,2009

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Ultraviolet out-of-band radiation studies in laser tin plasma sources;Journal of Applied Physics;2017-11-07

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