Sub-10-nm patterning process using directed self-assembly with high χ block copolymers-Reference-Cited by-同舟云学术

Sub-10-nm patterning process using directed self-assembly with high χ block copolymers

Published:2015-04-09 Issue:2 Volume:14 Page:023502
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Kihara Naoko¹,Seino Yuriko¹,Sato Hironobu¹,Kasahara Yusuke¹,Kobayashi Katsutoshi¹,Miyagi Ken¹,Minegishi Shinya¹,Yatsuda Koichi¹,Fujiwara Tomoharu¹,Hirayanagi Noriyuki¹,Kanai Hideki¹,Kawamonzen Yoshiaki¹,Kodera Katsuyoshi¹,Azuma Tsukasa¹,Hayakawa Teruaki²

Affiliation:

1. EUVL Infrastructure Development Center, Inc., DSA Research Department, 16-1 Onogawa, Tsukuba-shi, Ibaraki-ken 305-8569, Japan

2. Tokyo Institute of Technology, Department of Organic and Polymeric Materials, 2-12-1-S8-26 O-okayama, Meguro-ku, Tokyo 152-8552, Japan

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference22 articles.

1. Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns

2. Advanced Materials

3. Directed Assembly of Block Copolymer Blends into Nonregular Device-Oriented Structures

4. Advanced Materials

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