Maskless lithography: a low-energy electron-beam direct writing system with a common CP aperture and the recent progress-Reference-Cited by-同舟云学术

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Maskless lithography: a low-energy electron-beam direct writing system with a common CP aperture and the recent progress

Published:2003-06-13 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Nakasugi Tetsuro,Ando Atsushi,Inanami Ryoichi,Sasaki Noriaki,Ota Takumi,Nagano Osamu,Yamazaki Yuuichiro,Sugihara Kazuyoshi,Mori Ichiro,Miyoshi Motosuke,Okumura Katsuya,Miura Akira

Publisher

SPIE

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Character-Size Optimization for Reducing the Number of EB Shots of MCC Lithographic Systems;IEICE Transactions on Electronics;2010

2. Optimal character-size exploration for increasing throughput of MCC lithographic systems;Alternative Lithographic Technologies;2009-03-13

3. Development of Step-and-Scan-TypeXY-Stage System for Electron Beam Systems;Japanese Journal of Applied Physics;2007-09-20

4. Low-Energy Electron Beam Direct Writing Equipment;Japanese Journal of Applied Physics;2007-09-20

5. Exposure characteristics of character projection-type low-energy electron-beam direct writing system;SPIE Proceedings;2007-03-16

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