Character-Size Optimization for Reducing the Number of EB Shots of MCC Lithographic Systems-Reference-Cited by-同舟云学术

Character-Size Optimization for Reducing the Number of EB Shots of MCC Lithographic Systems

Published:2010 Issue:5 Volume:E93-C Page:631-639
ISSN:0916-8524
Container-title:IEICE Transactions on Electronics
language:en
Short-container-title:IEICE Trans. Electron.

Author:

SUGIHARA Makoto¹

Affiliation:

1. Department of Information and Computer Sciences, Toyohashi University of Technology

Publisher

Institute of Electronics, Information and Communications Engineers (IEICE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Link

http://www.jstage.jst.go.jp/article/transele/E93.C/5/E93.C_5_631/_pdf

Reference23 articles.

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2. [2] J. Hirumi, K. Kuriyama, N. Yoshioka, R. Yoshikawa, Y. Hojo, T. Matsuzaka, K. Tanaka, and M. Hoga, “Shot number analysis at 65nm node mask writing using VSB writer, ” Proc. SPIE Volume 5130: Photomask and Next-Generation Lithography Mask Technology X, pp.309-317, Yokohama, Japan, April 2003.

3. [3] ILOG, Inc., ILOG CPLEX 11.2, 2008.

4. [4] R. Inanami, S. Magoshi, S. Kousai, M. Hamada, T. Takayanagi, K. Sugihara, K. Okumura, and T. Kuroda, “Throughput enhancement strategy of maskless electron beam direct writing for logic device, ” Technical Digest of IEEE International Electron Devices Meeting, pp.833-836, San Francisco, CA, USA, Dec. 2000.

5. [5] R. Inanami, S. Magoshi, S. Kousai, A. Ando, T. Nakasugi, I. Mori, K. Sugihara, and A. Miura, “Maskless lithography: Estimation of the number of shots for each layer in a logic device with character-projection-type low-energy electron-beam direct writing system, ” Proc. SPIE Volume 5037: Emerging Lithographic Technologies VII, pp.1043-1050, Santa Clara, USA, June 2003.