Author:
van Lare Claire,Hsu Stephen,Finders Jo
Cited by
6 articles.
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1. High-NA mask phase-effects studied by AIMS EUV;Optical and EUV Nanolithography XXXVII;2024-04-10
2. Hyper NA EUV lithography: an imaging perspective;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-11-14
3. Mask absorber, mask tone, and wafer process impact on resist line-edge-roughness;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-10-13
4. Interaction between aberrations and mask 3D effects for low-n and Ta-based absorbers in extreme ultraviolet lithography;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-04-28
5. Attenuated phase shift masks: a wild card resolution enhancement for extreme ultraviolet lithography?;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-05-11