LIDT of HfO 2 /SiO 2 HR films by different test modes at 1064nm and 532nm-Reference-Cited by-同舟云学术

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LIDT of HfO 2 /SiO 2 HR films by different test modes at 1064nm and 532nm

Published:2010-10-13 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Ma Bin,Ding Tao,Jiao Hongfei,Zhou Gang,Shen Zhengxiang,Cheng Xinbin,Zhang Jinlong,Liu Huasong,Ji Yiqin,He Pengfei,Wang Zhanshan

Publisher

SPIE

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Temporal and spatial laser intensification within nodular defects overcoated with multilayer dielectric mirrors over a wide range of defect geometries;Applied Optics;2022-12-13

2. Plasma-Enhanced Atomic Layer Deposition of HfO₂ with Substrate Biasing: Thin Films for High-Reflective Mirrors;ACS Applied Materials & Interfaces;2022-03-21

3. Impact of high refractive coating material on the nodular-induced electric field enhancement for near infrared multilayer mirrors;Applied Optics;2019-11-25

4. Properties of defect-induced multiple pulse laser damage of transmission components;Applied Optics;2016-08-29

5. Preparation and stress evolution of sol–gel SiO2 antireflective coatings for small-size anisotropic lithium triborate crystals;AIP Advances;2016-04

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