Higher order feed-forward control of reticle writing error fingerprints-Reference-Cited by-同舟云学术

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Higher order feed-forward control of reticle writing error fingerprints

Published:2015-10-23 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

van Haren Richard,Cekli Hakki Ergun,Beltman Jan,Pastol Anne,Sundermann Frank,Gatefait Maxime

Publisher

SPIE

Reference8 articles.

1. Mask characterization for double patterning lithography;Bubke,2009

2. Advanced mask-to-mask overlay analysis for next generation technology node reticles;Roeth,2010

3. Mask registration impact on intrafield on-wafer overlay performance;Huang,2011

4. Impact of reticle writing errors on the on-product overlay performance;van Haren,2014

5. Evaluation of KLA-Tencor LMS IPRO-5 beta system for 22nm node registration and overlay applications;Ferber,2011

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Characterization of charging-induced pattern positioning errors in advanced mask making;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-06-03

2. Co-optimization of RegC and TWINSCAN corrections to improve the intra-field on-product overlay performance;SPIE Proceedings;2016-03-08

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