Author:
Sherwin Stuart,Waller Laura,Neureuther Andrew R.,Naulleau Patrick
Cited by
5 articles.
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1. Understanding and measuring EUV mask 3D effects;Optical and EUV Nanolithography XXXVII;2024-04-10
2. Investigation of waveguide modes in EUV mask absorbers;Journal of Micro/Nanopatterning, Materials, and Metrology;2021-05-20
3. Measuring EUV mask 3D effects with hyperspectral Zernike phase contrast imaging;Extreme Ultraviolet (EUV) Lithography XII;2021-03-09
4. Perspectives and tradeoffs of absorber materials for high NA EUV lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2020-10-01
5. Measuring the Phase of EUV Photomasks;International Conference on Extreme Ultraviolet Lithography 2019;2019-11-11