Author:
Krautschik Christof G.,Ito Masaaki,Nishiyama Iwao,Mori Takashi
Cited by
15 articles.
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1. Perspectives and tradeoffs of absorber materials for high NA EUV lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2020-10-01
2. Advanced EUV mask and imaging modeling;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-08-19
3. Enabling full-field physics-based optical proximity correction via dynamic model generation;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-07-25
4. Image-based pupil plane characterization via a space-domain basis;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-06-19
5. Measurement of EUV lithography pupil amplitude and phase variation via image-based methodology;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-06-28