Measurement of EUV lithography pupil amplitude and phase variation via image-based methodology-Reference-Cited by-同舟云学术

Measurement of EUV lithography pupil amplitude and phase variation via image-based methodology

Published:2016-06-28 Issue:2 Volume:15 Page:023508
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Levinson Zachary¹,Verduijn Erik²,Wood Obert R.²,Mangat Pawitter²,Goldberg Kenneth A.³,Benk Markus P.³,Wojdyla Antoine³,Smith Bruce W.¹

Affiliation:

1. Rochester Institute of Technology, 168 Lomb Memorial Drive, Rochester, New York 14623, United States

2. GLOBALFOUNDRIES, 400 Stone Break Road Extension, Malta, New York 12020, United States

3. Lawrence Berkeley National Laboratory, One Cyclotron Road, Berkeley, California 94720, United States

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference35 articles.

1. Extending SMO into the lens pupil domain

2. Pupil wavefront manipulation for optical nanolithography

3. Impact of pupil plane filtering on mask roughness transfer

4. Quantifying EUV imaging tolerances for the 70-, 50-, 35-nm modes through rigorous aerial image simulations

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1. Extreme ultraviolet microscope characterization using photomask surface roughness;Scientific Reports;2020-07-15

2. Rapid image-based pupil plane characterization for EUV lithography systems;International Conference on Extreme Ultraviolet Lithography 2018;2018-10-09

3. Image-based pupil plane characterization via a space-domain basis;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-06-19

4. Image-based pupil plane characterization for anamorphic lithography systems;SPIE Proceedings;2017-03-24