Author:
Neureuther Andrew R.,Long Luke,Naulleau Patrick
Cited by
3 articles.
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1. Lithography in a quantum world;Japanese Journal of Applied Physics;2023-02-17
2. The unfolding road from dust to trust;Advances in 3OM: Opto-Mechatronics, Opto-Mechanics, and Optical Metrology;2022-05-06
3. International Roadmap for Devices and Systems lithography roadmap;Journal of Micro/Nanopatterning, Materials, and Metrology;2021-10-04