Lithographic performance of an environmentally stable chemically amplified photoresist (ESCAP)-Reference-Cited by-同舟云学术

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Lithographic performance of an environmentally stable chemically amplified photoresist (ESCAP)

Published:1996-06-14 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Conley Will,Breyta Gregory,Brunsvold William R.,Di Pietro Richard A.,Hofer Donald C.,Holmes Steven J.,Ito Hiroshi,Nunes Ronald,Fichtl Gabrielle,Hagerty Peter,Thackeray James W.

Publisher

SPIE

Cited by 30 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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