1. W.H. Arnold, “Metrology in times of shrinking budgets,” Proc. SPIE 8681 (2013) 868102.
2. C.-M. Ke, G.-T. Huang, J. Huang, and J.R. Lee, “Accuracy of diffraction-based and image-based overlay,” Proc. SPIE 7971 (2011) 79711E.
3. N.M. Felix, A.H. Gabor, V.C. Menon, P.P. Longo, S.D. Halle, C.S. Koay, M.E. Colburn, “Overlay Improvement Roadmap: Strategies for Scanner Control and Product Disposition for 5 nm overlay,” Proc. SPIE 7971 (2011) 79711D.
4. Holistic optimization architecture enabling sub-14-nm projection lithography
5. A.S. Lexmond, E.J. van Zwet and D.J. Maas, “System and method for overlay control,” EP2602663.