Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography-Reference-Cited by-同舟云学术

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Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography

Published:2006-05-04 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Yoshizawa Masaki,Philipsen Vicky,Leunissen Leonardus H. A.,Hendrickx Eric,Jonckheere Rik,Vandenberghe Geert,Buttgereit Ute,Becker Hans,Koepernik Corinna,Irmscher Mathias

Publisher

SPIE

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Rigorous electromagnetic field mask modeling and related lithographic effects in the low $k_{1}$ and ultrahigh numerical aperture regime;Journal of Micro/Nanolithography, MEMS, and MOEMS;2007-07-01

2. Pupil plane analysis on AIMS 45-193i for advanced photomasks;SPIE Proceedings;2007-03-16

3. Characteristics optimization of mask materials for hyper-NA lithography;23rd European Mask and Lithography Conference;2007-02-08

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