Advanced mask inspection optical system (AMOS) using 198.5-nm wavelength for 65-nm (hp) node and beyond: system development and initial state D/D inspection performance-Reference-Cited by-同舟云学术

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Advanced mask inspection optical system (AMOS) using 198.5-nm wavelength for 65-nm (hp) node and beyond: system development and initial state D/D inspection performance

Published:2004-12-06 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Tojo Toru,Hirano Ryoich,Tsuchiya Hideo,Oaki Junji,Nishizaka Takeshi,Sanada Yasushi,Matsuki Kazuto,Isomura Ikunao,Ogawa Riki,Kobayashi Noboru,Nakashima Kazuhiro,Sugihara Shinji,Inoue Hiromu,Imai Shinichi,Suzuki Hitoshi,Sekine Akihiko,Taya Makoto,Miwa Akemi,Yoshioka Nobuyuki,Ohira Katsumi,Chung Dong-Hoon,Otaki Masao

Publisher

SPIE

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