1. Improving optical measurement accuracy using multi-technique nested uncertainties;Silver,2009
2. Hybrid reference metrology exploiting patterning simulation;Rana,2010
3. 3D-AFM Enhancement for CD Metrology Dedicated to Lithography Sub-28 nm Node Requirements;Foucher,2010
4. Nested Uncertainties and Hybrid Metrology to Improve Measurement Accuracy;Silver,2011
5. A Bayesian Statistical Model for Hybrid Metrology to Improve Measurement Accuracy;Silver,2011