Optimizing fused silica polishing processes for 351nm high-power laser application-Reference-Cited by-同舟云学术

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Optimizing fused silica polishing processes for 351nm high-power laser application

Published:2008-10-08 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Laser-Induced Damage in Optical Materials: 2008
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Author:

Néauport J.,Ambard C.,Bercegol H.,Cahuc O.,Champreux J. P.,Charles J. L.,Cormont P.,Darbois N.,Darnis P.,Destribats J.,Fargin E.,Iordanoff I.,Laheurte R.,Lamaignère L.,Legros P.,Mercier R.,Pilon F.

Publisher

SPIE

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Automatic detection of quartz glass subsurface defects by laser scattering method based on an ellipsoidal mirror;Applied Optics;2024-03-25

2. Toward little heat-affected area of fused silica materials using short pulse and high power CO2 laser;Results in Physics;2019-03

3. Influence of Cutting Speed on Subsurface Damage Morphology and Distribution in Ground Fused Silica;Inventions;2017-08-10

4. CO2 laser microprocessing for laser damage growth mitigation of fused silica optics;Optical Engineering;2016-10-17

5. Combination of reaction ion etching and dynamic chemical etching for improving laser damage resistance of fused silica optical surfaces;Optics Letters;2016-09-21

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