Exploring the limits of phase-shift lithography: Part I--the alternating shifter

Author:

Palmer Shane R.,Garza, Sr. Cesar M.,Sager Craig B.,Reynolds Patrick

Publisher

SPIE

Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. 14-nm photomask simulation sensitivity;SPIE Proceedings;2014-10-17

2. Impact of 14-nm photomask uncertainties on computational lithography solutions;Journal of Micro/Nanolithography, MEMS, and MOEMS;2013-12-02

3. The impact of 14nm photomask variability and uncertainty on computational lithography solutions;SPIE Proceedings;2013-09-10

4. The impact of 14-nm photomask uncertainties on computational lithography solutions;SPIE Proceedings;2013-04-12

5. Challenges for patterning process models applied to large scale;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2012-05

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