Nanofabrication of low extinction coefficient and high-aspect-ratio Si structures for metaphotonic applications
Author:
Affiliation:
1. Samsung Electronics Co., Ltd. (Korea, Republic of)
Publisher
SPIE
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1. Subwavelength-thick lenses with high numerical apertures and large efficiency based on high-contrast transmitarrays
2. Flat optics with designer metasurfaces
3. Multiwavelength achromatic metasurfaces by dispersive phase compensation
4. Sub-Wavelength Grating Lenses With a Twist
5. Flat dielectric grating reflectors with focusing abilities
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1. Investigation of Capping Layer on Characteristics of Poly-GeSn Junctionless p-Channel Thin Film Transistors;ECS Journal of Solid State Science and Technology;2019
2. Visible Wavelength Color Filters Using Dielectric Subwavelength Gratings for Backside-Illuminated CMOS Image Sensor Technologies;Nano Letters;2017-04-13
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